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A user's guide to ellipsometry

Author: Harland G Tompkins
Publisher: Boston : Academic Press, ©1993.
Edition/Format:   eBook : Document : EnglishView all editions and formats
This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The  Read more...
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Genre/Form: Electronic books
Case studies
Cas, Études de
Additional Physical Format: Print version:
Tompkins, Harland G.
User's guide to ellipsometry.
Boston : Academic Press, ©1993
(DLC) 92026866
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Harland G Tompkins
ISBN: 1299195350 9781299195356 0323140009 9780323140003
Language Note: English.
OCLC Number: 680434117
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (xv, 260 pages) : illustrations
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Contents: Front Cover; A User's Guide to Ellipsometry; Copyright Page; Table of Contents; Preface; Chapter 1.Theoretical Aspects; 1.1 Description of an Electromagnetic Wave; 1.2 Interaction of Light with material; 1.3 Polarized Light; 1.4 Reflections; 1.5 Ellipsometry Definitions; 1.6 References; Chapter 2. Instrumentation; 2.1 Fundamentals and History; 2.2 Optical Elements; 2.3 The Manual Null Instrument; 2.4 Rotating Element Instruments; 2.5 References; Chapter 3. Using Optical Parameters to Determine Material Properties; 3.1 Del/Psi and n and k for Substrates 3.2 The Calculation of Del/Psi Trajectories for Films on Substrates3.3 Trajectories for Transparent Films; 3.4 Trajectories for Absorbing Films; 3.5 Two-Film Structures; 3.6 References; Chapter 4. Determining Optical Parameters for Inaccessible substrates and Unknown Films; 4.1 Inaccessible Substrates and Unknown Films; 4.2 Determining Film-Free Values of Del and Psi; 4.3 Determining the Complex Index of Refraction of the Film; 4.4 Summary; 4.5 References; Chapter 5. Extremely Thin Films; 5.1 General Principles; 5.2 Some Examples of Extremely Thin Films; 5.3 Summary; 5.4 References Chapter 6. The Special Case of Polysilicon6.1 General; 6.2 Range of the Optical Constants; 6.3 Del/Psi Trajectories in General; 6.4 Effect of the Coefficient of Extinction; 6.5 Effect of the Index of Refraction; 6.6 Requirements; 6.7 Measuring the Thickness of Oxide on Polysilicon; 6.8 Simplifications; 6.9 References; Chapter 7. The Effect of Roughness; 7.1 General; 7.2 Macroscopic Roughness; 7.3 Microscopic Roughness; 7.4 Perspective; 7.5 Substrate Roughness; 7.6 Film Growth with Roughness; 7.7 References; Part1: Case Studies; Case 1: Dissolution and Swelling of Thin Polymer Films C1.1 GeneralC1.2 Early Work using a Psi-Meter; C1.3 Later Work using an Ellipsometer; C1.4 Modeling the Swollen Film; C1.5 Comparison of Data with Model; Cl.6 References; Case 2: Ion Beam Interaction with Silicon; C2.1 General; C2.2 Development of the Analysis Method; C2.3 Ion Beam Damage Results; C2.4 Damage Removal; C2.5 References; Case 3: Dry Oxidation of Metals; C3.1 General; C3.2 Oxidation of Bismuth at Room Temperature; C3.3 Plasma Oxidation of Tantalum; C3.4 Thermal Oxidation of Nickel; C3.5 References; Case 4: Optical Properties of Sputtered Chromium Suboxide Thin Films; C4.1 General C4.2 Film Preparation and Auger AnalysisC4.3 Optical Measurements; C4.4 Reference; Case 5: Ion-Assisted Film Growth of Zirconium Dioxide; C5.1 Experimental Apparatus; C5.2 Optical Measurements; C5.3 References; Case 6: Electrochemical/Ellipsometric Studies of Oxides on Metals; C6.1 General; C6.2 Experimental Methods; C6.3 Oxide Growth: 1. Zirconium; C6.4 Oxide Growth: 2. Titanium; C6.5 Oxide Growth: 3. Vanadium; C6.6 Deposition of Oxides: 1. Lead; C6.7 Deposition of Oxides: 2. Manganese; C6.8 References; Case 7: Amorphous Hydrogenated Carbon Films; C7.1 General
Responsibility: Harland G. Tompkins.


Specifically designed for the user who wants expanded use of ellipsometry beyond the relatively limited number of turn-key applications, this text provides comprehensive discussion of the measurement  Read more...
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