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A User's Guide to Ellipsometry.

Author: Harland G Tompkins
Publisher: Oxford : Elsevier Science, 1992.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The  Read more...
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Genre/Form: Electronic books
Case studies
Additional Physical Format: Print version:
Tompkins, Harland G.
A User's Guide to Ellipsometry.
Oxford : Elsevier Science, ©1992
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Harland G Tompkins
ISBN: 9780323140003 0323140009
OCLC Number: 829460313
Notes: C7.2 Mechanism of Film Formation.
Description: 1 online resource (279 pages)
Contents: Front Cover; A User's Guide to Ellipsometry; Copyright Page; Table of Contents; Preface; Chapter 1. Theoretical Aspects; 1.1 Description of an Electromagnetic Wave; 1.2 Interaction of Light with material; 1.3 Polarized Light; 1.4 Reflections; 1.5 Ellipsometry Definitions; 1.6 References; Chapter 2. Instrumentation; 2.1 Fundamentals and History; 2.2 Optical Elements; 2.3 The Manual Null Instrument; 2.4 Rotating Element Instruments; 2.5 References; Chapter 3. Using Optical Parameters to Determine Material Properties; 3.1 Del/Psi and n and k for Substrates. 3.2 The Calculation of Del/Psi Trajectories for Films on Substrates3.3 Trajectories for Transparent Films; 3.4 Trajectories for Absorbing Films; 3.5 Two-Film Structures; 3.6 References; Chapter 4. Determining Optical Parameters for Inaccessible substrates and Unknown Films; 4.1 Inaccessible Substrates and Unknown Films; 4.2 Determining Film-Free Values of Del and Psi; 4.3 Determining the Complex Index of Refraction of the Film; 4.4 Summary; 4.5 References; Chapter 5. Extremely Thin Films; 5.1 General Principles; 5.2 Some Examples of Extremely Thin Films; 5.3 Summary; 5.4 References. Chapter 6. The Special Case of Polysilicon6.1 General; 6.2 Range of the Optical Constants; 6.3 Del/Psi Trajectories in General; 6.4 Effect of the Coefficient of Extinction; 6.5 Effect of the Index of Refraction; 6.6 Requirements; 6.7 Measuring the Thickness of Oxide on Polysilicon; 6.8 Simplifications; 6.9 References; Chapter 7. The Effect of Roughness; 7.1 General; 7.2 Macroscopic Roughness; 7.3 Microscopic Roughness; 7.4 Perspective; 7.5 Substrate Roughness; 7.6 Film Growth with Roughness; 7.7 References; Part1: Case Studies; Case 1: Dissolution and Swelling of Thin Polymer Films. C1.1 GeneralC1.2 Early Work using a Psi-Meter; C1.3 Later Work using an Ellipsometer; C1.4 Modeling the Swollen Film; C1.5 Comparison of Data with Model; Cl. 6 References; Case 2: Ion Beam Interaction with Silicon; C2.1 General; C2.2 Development of the Analysis Method; C2.3 Ion Beam Damage Results; C2.4 Damage Removal; C2.5 References; Case 3: Dry Oxidation of Metals; C3.1 General; C3.2 Oxidation of Bismuth at Room Temperature; C3.3 Plasma Oxidation of Tantalum; C3.4 Thermal Oxidation of Nickel; C3.5 References; Case 4: Optical Properties of Sputtered Chromium Suboxide Thin Films; C4.1 General. C4.2 Film Preparation and Auger AnalysisC4.3 Optical Measurements; C4.4 Reference; Case 5: Ion-Assisted Film Growth of Zirconium Dioxide; C5.1 Experimental Apparatus; C5.2 Optical Measurements; C5.3 References; Case 6: Electrochemical/Ellipsometric Studies of Oxides on Metals; C6.1 General; C6.2 Experimental Methods; C6.3 Oxide Growth: 1. Zirconium; C6.4 Oxide Growth: 2. Titanium; C6.5 Oxide Growth: 3. Vanadium; C6.6 Deposition of Oxides: 1. Lead; C6.7 Deposition of Oxides: 2. Manganese; C6.8 References; Case 7: Amorphous Hydrogenated Carbon Films; C7.1 General.

Abstract:

This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The book also addresses polysilicon, a material commonly used in the microelectronics industry, and the effect of substrate roughness. This book's concepts and applications are reinforced.
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