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A User's Guide to Ellipsometry.

Autore: Harland G Tompkins
Pubblicazione: Newburyport : Dover Publications, 2013.
Serie: Dover Civil and Mechanical Engineering; EBL-Schweitzer
Edizione/Formato:   eBook : Document : English : Online-ausgVedi tutte le edizioni e i formati
Sommario:
Title Page; Copyright Page; Table of Contents; Preface; Chapter 1 - Theoretical Aspects; 1.1 Description of an Electromagnetic Wave; 1.2 Interaction of Light with Material; 1.2.1 The Complex Index of Refraction; 1.2.2 Laws of Reflection and Refraction; 1.2.3 Dispersion; 1.2.4 The Effect of Temperature; 1.3 Polarized Light; 1.3.1 Linearly Polarized Light; 1.3.2 Elliptically Polarized Light; 1.4 Reflections; 1.4.1
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Dettagli

Genere/formato: Electronic books
Tipo materiale: Document, Risorsa internet
Tipo documento Risorsa Internet, Computer file
Tutti gli autori / Collaboratori: Harland G Tompkins
ISBN: 9780486151922 0486151921
Numero OCLC: 904451574
Descrizione: Online-Ressource (1 online resource (353 Seiten)).
Titolo della serie: Dover Civil and Mechanical Engineering; EBL-Schweitzer

Sinossi:

Title Page; Copyright Page; Table of Contents; Preface; Chapter 1 - Theoretical Aspects; 1.1 Description of an Electromagnetic Wave; 1.2 Interaction of Light with Material; 1.2.1 The Complex Index of Refraction; 1.2.2 Laws of Reflection and Refraction; 1.2.3 Dispersion; 1.2.4 The Effect of Temperature; 1.3 Polarized Light; 1.3.1 Linearly Polarized Light; 1.3.2 Elliptically Polarized Light; 1.4 Reflections; 1.4.1 Coordinate System for Reflections; 1.4.2 Fresnel Reflection Coefficients and the Brewster Angle; 1.4.3 Total Reflection Coefficients for Multiple Interfaces.

1.5 Ellipsometry Definitions1.5.1 Del and Psi; 1.5.2 The Fundamental Equation of Ellipsometry; 1.6 References; Chapter 2 - Instrumentation; 2.1 Fundamentals and History; 2.2 Optical Elements; 2.2.1 The Light Source; 2.2.2 Polarizers and Analyzers; 2.2.3 The Quarter-Wave Plate; 2.2.4 The Reflection; 2.2.5 The Detector; 2.3 The Manual Null Instrument; 2.3.1 Conceptual; 23.2 Actual Practice; 2.4 Rotating Element Instruments; 2.4.1 The Rotating Null Instrument; 2.4.2 The Photometric Instrument; 2.5 References; Chapter 3 - Using Optical Parameters to Determine Material Properties.

3.1 Del/Psi and n and k for Substrates3.2 The Calculation of Del/Psi Trajectories for Films on Substrates; 3.3 Trajectories for Transparent Films; 3.4 Trajectories for Absorbing Films; 3.5 Two-Film Structures; 3.5.1 Transparent Films on Top; 3.5.2 Absorbing Films on Top; 3.6 References; Chapter 4 - Determining Optical Parameters for Inaccessible Substrates and Unknown Films; 4.1 Inaccessible Substrates and Unknown Films; 4.2 Determining Film-Free Values of Del and Psi; 4.2.1 An Example Using One Method; 4.2.2 An Example Using Another Method.

4.3 Determining the Complex Index of Refraction of the Film4.3.1 Description of the Materials for the Example; 4.3.2 Determining the Film-Free Point; 4.3.3 The Film Index; 4.4 Summary; 4.5 References; Chapter 5 - Extremely Thin Films; 5.1 General Principles; 5.2 Some Examples of Extremely Thin Films; 5.2.1 Oxygen and Carbon Monoxide Adsorption on Silver; 5.2.2 Adsorption of Xe on Ag(111); 5.2.3 Oxidation of Beryllium; 5.3 Summary; 5.4 References; Chapter 6 - The Special Case of Polysilicon; 6.1 General; 6.2 Range of the Optical Constants; 6.3 Del/Psi Trajectories in General.

6.4 Effect of the Coefficient of Extinction6.5 Effect of the Index of Refraction; 6.6 Requirements; 6.7 Measuring the Thickness of Oxide on Polysilicon; 6.8 Simplifications; 6.9 References; Chapter 7 - The Effect of Roughness; 7.1 General; 7.2 Macroscopic Roughness; 7.3 Microscopic Roughness; 7.4 Perspective; 7.5 Substrate Roughness; 7.5.1 Near-Dielectric; 7.5.2 Metallic; 7.6 Film Growth with Roughness; 7.6.1 Perspective; 7.6.2 Estimation of Uncertainty; 7.7 References; CASE STUDIES; Case 1: - Dissolution and Swelling of Thin Polymer Films; C1.1 General; C1.2 Early Work Using a Psi-meter.

C1.3 Later Work Using an Ellipsometer.

This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry - particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical con.

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