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A User's Guide to Ellipsometry.

Autore: Harland G Tompkins
Pubblicazione: Saint Louis : Elsevier Science, 2014.
Edizione/Formato:   eBook : Document : EnglishVedi tutte le edizioni e i formati
Sommario:
This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The  Per saperne di più…
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Dettagli

Genere/formato: Electronic books
Informazioni aggiuntive sul formato: Print version:
Tompkins, Harland G.
A User's Guide to Ellipsometry.
Saint Louis : Elsevier Science, ©2014
Tipo materiale: Document, Risorsa internet
Tipo documento Risorsa Internet, Computer file
Tutti gli autori / Collaboratori: Harland G Tompkins
ISBN: 9780323140003 0323140009
Numero OCLC: 956672765
Note: C6.7 Deposition of Oxides: 2. Manganese.
Descrizione: 1 online resource (279 pages)
Contenuti: Front Cover --
A User's Guide to Ellipsometry --
Copyright Page --
Table of Contents --
Preface --
Chapter 1. Theoretical Aspects --
1.1 Description of an Electromagnetic Wave --
1.2 Interaction of Light with material --
1.3 Polarized Light --
1.4 Reflections --
1.5 Ellipsometry Definitions --
1.6 References --
Chapter 2. Instrumentation --
2.1 Fundamentals and History --
2.2 Optical Elements --
2.3 The Manual Null Instrument --
2.4 Rotating Element Instruments --
2.5 References --
Chapter 3. Using Optical Parameters to Determine Material Properties --
3.1 Del/Psi and n and k for Substrates. 3.2 The Calculation of Del/Psi Trajectories for Films on Substrates --
3.3 Trajectories for Transparent Films --
3.4 Trajectories for Absorbing Films --
3.5 Two-Film Structures --
3.6 References --
Chapter 4. Determining Optical Parameters for Inaccessible substrates and Unknown Films --
4.1 Inaccessible Substrates and Unknown Films --
4.2 Determining Film-Free Values of Del and Psi --
4.3 Determining the Complex Index of Refraction of the Film --
4.4 Summary --
4.5 References --
Chapter 5. Extremely Thin Films --
5.1 General Principles --
5.2 Some Examples of Extremely Thin Films --
5.3 Summary. 5.4 References --
Chapter 6. The Special Case of Polysilicon --
6.1 General --
6.2 Range of the Optical Constants --
6.3 Del/Psi Trajectories in General --
6.4 Effect of the Coefficient of Extinction --
6.5 Effect of the Index of Refraction --
6.6 Requirements --
6.7 Measuring the Thickness of Oxide on Polysilicon --
6.8 Simplifications --
6.9 References --
Chapter 7. The Effect of Roughness --
7.1 General --
7.2 Macroscopic Roughness --
7.3 Microscopic Roughness --
7.4 Perspective --
7.5 Substrate Roughness --
7.6 Film Growth with Roughness --
7.7 References --
Part1: Case Studies. Case 1: Dissolution and Swelling of Thin Polymer Films --
C1.1 General --
C1.2 Early Work using a Psi-Meter --
C1.3 Later Work using an Ellipsometer --
C1.4 Modeling the Swollen Film --
C1.5 Comparison of Data with Model --
Cl. 6 References --
Case 2: Ion Beam Interaction with Silicon --
C2.1 General --
C2.2 Development of the Analysis Method --
C2.3 Ion Beam Damage Results --
C2.4 Damage Removal --
C2.5 References --
Case 3: Dry Oxidation of Metals --
C3.1 General --
C3.2 Oxidation of Bismuth at Room Temperature --
C3.3 Plasma Oxidation of Tantalum --
C3.4 Thermal Oxidation of Nickel. C3.5 References --
Case 4: Optical Properties of Sputtered Chromium Suboxide Thin Films --
C4.1 General --
C4.2 Film Preparation and Auger Analysis --
C4.3 Optical Measurements --
C4.4 Reference --
Case 5: Ion-Assisted Film Growth of Zirconium Dioxide --
C5.1 Experimental Apparatus --
C5.2 Optical Measurements --
C5.3 References --
Case 6: Electrochemical/Ellipsometric Studies of Oxides on Metals --
C6.1 General --
C6.2 Experimental Methods --
C6.3 Oxide Growth: 1. Zirconium --
C6.4 Oxide Growth: 2. Titanium --
C6.5 Oxide Growth: 3. Vanadium --
C6.6 Deposition of Oxides: 1. Lead.

Sinossi:

This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The book also addresses polysilicon, a material commonly used in the microelectronics industry, and the effect of substrate roughness. This book's concepts and applications are reinforced through the 14 case studies that illustrate specific applications of ellipsometry from the semiconductor industry as well as studies involving corrosion and oxide growth. Key Features* Allows the user to optimize turn-key operation of ellipsometers and move beyond limited turn-key applications* Provides comprehensive discussion of the measurement of film thickness and optical constants in film* Discusses the trajectories of the ellipsometric parameters Del and Psi and how changes in the materials affect the parameters* Includes 14 case studies to reinforce specific applications* Includes three appendices for helpful references.
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